Multiprobe MBE System for thin film deposition combined with Multiprobe S for sample analysis

The MULTIPROBE S is part of the family of multi-technique surface science UHV systems, designed to provide the performance and flexibility demanded by todays research environment. The MULTIPROBE S with its single chamber surface science UHV system with large multi-technique (µ-metal) analysis chamber for electron spectroscopy, UHV scanning probe microscopy, PEEM and sample preparation. The MULTIPROBE MBE employs state-of-the-art components for the MBE growth: sophisticated substrate manipulators at high temperature, standard MBE sources, sources dedicated for low or high temperatures, for low or high growth rates and extremely pure doping conditions. The deposition chamber has a 12“ base cluster flange for six 2.75“ O.D. for effusion cells (other configurations possible). Provision for in-situ monitoring techniques such as pyrometry, ellipsometry, and reflectance spectroscopy as well as software/hardware control system for the growth process are standard. An easy to operate sample transfer system facilitates the sample transfer between SPM, analysis chamber, MBE system and fast entry sample load lock (FEL).

Frontview onto the analysis (left) and depostion chamber (right). Multiprobe MBE System for thin film deposition of metals (e.g. Au, Cu, Pt) combined with Multiprobe S for sample analysis on Omicron standard sample plates. Configuration of analysis system: VT-AFM 25 with Kelvin regulator, High Resolution Electron Analyser HR-U7, HIS 13 UV excitation source for UPS, EKF 300 electron gun for AES, ISE 10 sputter gun; PEEM with Imaging Energy Filter (IEF), LN2 cooled sample stage, Hg and HIS 13 UV excitation source Configuration of MBE system: LN2 cooling shroud, sample manipulator for sample heating, base flange with Knudsen cells for metal evaporation (HTEZ – high temperature effusion cell for Pt; WEZ – effusion cell for Au and Cu), RF Atom Source for Oxygen or Nitrogen, RHEED and film thickness monitor.

When the desired structures are in the nanometer range, every combination of MBE with Nanoanalytics requires deep consideration of the level of vibrations throughout the system. For a company with more than 15 years experience of building UHV-systems as well as the incorporated Scanning Probe Microscopes with atomic resolution, such consideration is natural and straightforward. Consequently the MULTIPROBE MBE is build with a rigidity and stability uncommon to standard MBE systems.